02/05/2026 | Press release | Distributed by Public on 02/06/2026 00:14
News | Feb 05, 2026
As quantum computing evolves from theoretical promise to practical reality, the complexity of building quantum hardware has come sharply into focus. Quantum computing is reshaping what's possible in science, industry, and technology-at the heart of this revolution is the fundamental building block: the qubit. These quantum bits, which can exist in multiple states simultaneously, are expected to accelerate breakthroughs in such industries as defense, pharmaceuticals, chemicals, automotive, finance and logistics.
It should be noted that the intent of quantum computing is not to replace classical computing but to augment it by helping solve specific, ultra-complex problems. Behind the creation of these powerful qubits is a sophisticated web of material science, precision engineering, and vacuum-based deposition technologies.
There is currently no single dominant architecture for quantum computers. Some designs rely on superconducting materials, others on trapped ions or semiconductor quantum dots. Each approach brings unique manufacturing challenges. What unifies them all? The need for ultra-pure materials, atomically precise layering, and extreme control over interfaces and surfaces.
That's where Veeco comes in. Our portfolio spans molecular beam epitaxy (MBE), atomic layer deposition (ALD), ion beam etch and deposition (IBE/IBD), advanced wet processing, laser spike annealing (LSA), and metal-organic chemical vapor deposition (MOCVD)-supporting nearly every material and fabrication step required to bring qubit devices to life.
There are 7-8 qubit dominant types, and when customers come to us, they typically already know which one they want to implement, but they need equipment solutions that offer high performance and reliability. Rather than just supplying equipment, Veeco partners deeply with these quantum innovators. Because we offer material science-based solutions for multiple critical process steps, customers can address the full spectrum of materials challenges for their specific applications.
We provide coordinated solutions for materials deposition, patterning, and surface preparation-essential processes for building scalable quantum architectures. Virtually all of Veeco's major technologies have applications for qubit manufacturing:
enables epitaxial growth of superconductors (e.g., Al, Nb, NbTiN) and compound semiconductors (e.g., GaAs/AlGaAs). Our GENxplor™ and GEN20-Q™ MBE systems are used to grow superconducting materials (such as epitaxial Al or Nb films) and semiconductor heterostructures for spin qubits.
are essential for qubit designs that require the formation of ultra-thin, high-quality dielectrics-vital for tunnel barriers in Josephson junctions or the encapsulation of defect-based qubits. ALD's ability to coat deep trenches or complex chip surfaces uniformly is often needed in quantum chip packages and 3D integration schemes. Our ALD technology is finding notable success for superconducting films-we have sold multiple systems for this purpose. One example is NbN or NbTiN superconducting films for through-silicon vias (TSVs).
enabled by surface prep and cleaning systems, ensures contamination-free surfaces before deposition of superconducting contacts-essential for achieving high-quality qubit interfaces. Wet processing systems enable HF last cleans, polymer removal, and other gentle processes, helping to maximize yield of qubit devices.
are useful for nanoscale pattern transfer, metal lift-off, and deposition of hard-to-evaporate or magnetic materials. Ion beam tools deliver the precision etching and metal deposition required to define nano-scale quantum circuits and integrate photonic elements.
enable deposition of SiC for nitrogen-vacancy center qubits and SiGe for spin-based qubits. As the market develops, we see further opportunities for MOCVD technology to grow SiC, GaN and other materials for quantum emitters and sensors.
enables dopant activation or stress tuning in CMOS-compatible quantum structures, resulting in optimized interfaces. Rapid thermal processing can be used to repair damage in qubit materials without excessive diffusion.
Our systems are designed not just for lab-scale experimentation but for scalable manufacturing. Take our GEN20-Q system, shown here. A fully integrated MBE platform, the GEN20-Q is optimized for cleanliness (with enhanced cryogenic cooling and pumping pathways), flexibility (support for ALD integration and multiple deposition modules), and precision (with flux control for reliable metal deposition).
Quantum devices are particularly sensitive to contamination and thermal instability, and the GEN20-Q MBE system was designed with this in mind. The system supports UHV transfers to other technologies, such as Veeco's ALD platform. It also supports 1400°C substrate heating and accommodates multiple quantum material types in a single cluster tool environment-minimizing atmospheric exposure and maximizing reproducibility.
With more than 30 systems installed globally for quantum device development, Veeco is a trusted partner for both research and manufacturing. Institutions like Quantum Foundry Copenhagen rely on our high-performance systems, particularly the GEN20-Q, to explore new frontiers in superconducting and spin qubit development.
As the quantum computing landscape continues to evolve, moving from lab-scale experiments to scalable production, so too will the materials and processes needed to support it. Accordingly, Veeco's focus on reliability, automation readiness, and modularity will become increasingly critical. Our cluster-compatible platforms, UHV-transfer capabilities, and customizable configurations support not only experimentation but also the early-stage production of quantum devices.
Whether you're working on spin qubits, quantum photonics, or superconducting architectures, Veeco's experienced developers are ready to collaborate with your team to help engineer the materials foundation of quantum computing.
Al - aluminum
AlGaAs - aluminum gallium arsenide
GaAs - gallium arsenide
GaN - gallium nitride
HF - hydrofluoric acid
Nb - niobium
NbN - niobium nitride
NbTiN - niobium-titanium-nitride
SiC - silicon carbide
SiGe - silicon germanium